Wafer shaking and rotating device

The utility model belongs to the technical field of automatic cleaning machines, and particularly relates to a wafer shaking and rotating device which comprises a lifting mechanism, a rotating mechanism and a shaking mechanism. Wherein the shaking mechanism is provided with at least one box body placing groove used for placing a wafer box, and the shaking mechanism is immersed in the wafer cleaning groove; the lifting mechanism drives the rotating mechanism and the shaking mechanism to longitudinally move, so that the wafer box longitudinally moves in the wafer cleaning tank; the rotating mechanism drives the corresponding eccentric rods in the shaking mechanism to rotate, so that the eccentric rods push the corresponding wafers in the wafer box to rotate in the corresponding box body placing grooves; the lifting mechanism and the rotating mechanism are adopted, the problems that a traditional rotating mechanism is prone to clamping stagnation in action, the structure is prone to corrosion, the wafer is prone