Single crystal furnace shutdown rapid cooling thermal field device and single crystal furnace
The utility model relates to the technical field of monocrystalline silicon production equipment, in particular to a single crystal furnace shutdown rapid cooling thermal field device and a single crystal furnace. The utility model relates to a single crystal furnace shut-down rapid cooling thermal...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to the technical field of monocrystalline silicon production equipment, in particular to a single crystal furnace shutdown rapid cooling thermal field device and a single crystal furnace. The utility model relates to a single crystal furnace shut-down rapid cooling thermal field device, which comprises an upper thermal insulation cylinder and a middle-lower thermal insulation cylinder which can be separated up and down, a middle gap is formed after the upper thermal insulation cylinder and the middle-lower thermal insulation cylinder are separated, and the gap distance of the middle gap is adjustable. A large amount of heat in a thermal field is radiated through the gap between the upper thermal insulation cylinder and the middle-lower thermal insulation cylinder, heat in a high-temperature area in the single crystal furnace is directly radiated to the furnace wall, the furnace wall maintains a single crystal production low-pressure environment, waste heat of the thermal field is tak |
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