Crystalline silicon cell phosphorus diffusion equipment
The utility model discloses phosphorus diffusion equipment for a crystalline silicon cell. The phosphorus diffusion equipment comprises a shell, and a cavity, a boat support, an air inlet part and an air outlet part which are enclosed by the shell, the boat support is arranged in the cavity and is u...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses phosphorus diffusion equipment for a crystalline silicon cell. The phosphorus diffusion equipment comprises a shell, and a cavity, a boat support, an air inlet part and an air outlet part which are enclosed by the shell, the boat support is arranged in the cavity and is used for placing to-be-processed silicon wafers of which the front surfaces are laminated and stacked; the air outlet part is arranged on the side wall of the shell and used for being connected with an external air exhaust system and matched with the air inlet part to achieve updating of the gas environment in the cavity. And the gas inlet part extends along the bottom of the inner side of the shell, so that the cavity is gradually filled with gas from the bottom to the top. According to the utility model, the phosphorus-containing gas cannot directly blow the front surface of the silicon wafer, thereby greatly reducing the diffusion degree of phosphorus on the front surface of the silicon wafer to be processed, sav |
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