Cleaning device for semiconductor production and processing

The utility model discloses a cleaning device for semiconductor production and processing, which comprises an ultrasonic cleaning machine, four corners of the lower surface of the ultrasonic cleaning machine are fixedly connected with supporting bottom feet for supporting work and anti-skid work, an...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WU YAOHUI, KIM EUN-TAEK, WANG XIANBING, YUN JONG-MAN, HU XIANZHONG
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model discloses a cleaning device for semiconductor production and processing, which comprises an ultrasonic cleaning machine, four corners of the lower surface of the ultrasonic cleaning machine are fixedly connected with supporting bottom feet for supporting work and anti-skid work, and a drain outlet of the ultrasonic cleaning machine is provided with a control valve blow-off pipe for controlling blow-off work. A water inlet of the ultrasonic cleaning machine is provided with a water inlet pipe used for being connected with an external water pipe, the stainless steel net bag containing raw materials can stretch into a cleaning tank in the ultrasonic cleaning machine through stretching work of the electric hydraulic rod, and the stainless steel net bag is suspended in the cleaning tank in the ultrasonic cleaning machine. Therefore, the raw materials can be prevented from falling into the bottom of the cleaning tank in the ultrasonic cleaning machine, meanwhile, the stirring rod is driven by the