Plasma reaction device for regulating and controlling surface defects of semiconductor functional material

The utility model discloses a plasma reaction device for regulating and controlling surface defects of a semiconductor functional material, which comprises a sealing box, a base is arranged at the bottom of the sealing box, and an upper polar plate and a lower polar plate are respectively arranged at the top and the bottom of an inner cavity of the sealing box through supporting rods. The left side of an inner cavity of the sealing box is rotationally connected with a hollow pipe, one end of the hollow pipe penetrates through the sealing box and is rotationally connected with an air inlet pipe, an auxiliary mechanism matched with the hollow pipe for use is arranged in the sealing box, the right side of the sealing box communicates with a main pipe, and the right side of the main pipe communicates with a bent pipe; according to the utility model, the internal space of the sealing box can be more quickly filled with gas by utilizing the auxiliary mechanism, and meanwhile, the rotating first communication frame