Single wafer cleaning equipment for realizing etching reaction of gradient structure

The utility model discloses single wafer cleaning equipment for realizing etching reaction of a gradient structure, and relates to the technical field of cleaning equipment, the single wafer cleaning equipment comprises a mounting plate, four spraying mechanisms, a supporting mechanism and a waste liquid collecting mechanism, the upper end of the mounting plate is provided with the four spraying mechanisms, and the waste liquid collecting mechanism is arranged among the four spraying mechanisms. A supporting mechanism is arranged on each spraying mechanism; each spraying mechanism comprises a supporting frame, a connecting rod and a sprayer, the supporting frame is arranged at the upper end of the mounting plate, the connecting rod is arranged on the side, close to the waste liquid collecting mechanism, of the supporting frame, and the sprayer is rotatably arranged at the lower end of the connecting rod and is arranged in a step shape; each spray head comprises a first liquid outlet, a second liquid outlet an