Plasma reaction process gas heating device

The utility model discloses a plasma reaction process gas heating device which comprises an MFC quality control flowmeter, a gas pipeline, a gas storage device, a heating device, an OES detector and a controller, the MFC quality control flowmeter is connected to the top of a process cavity through the gas pipeline, the gas storage device is arranged on the gas pipeline, and the OES detector is arranged on the heating device. A heating device is arranged on the gas storage device, the OES detector is mounted at an opening in one side of the process cavity, the OES detector is connected with the controller, and the controller is connected with the heating device. Compared with the prior art, the plasma reaction device has the advantages that the OES detector, the temperature controller and the heating device are matched to control the temperature of gas in the gas pipeline, so that the plasma reaction intensity in the cavity is stably adjusted and controlled. 本实用新型公开了一种等离子反应工艺气体加热装置，包括MFC质量控制流量计、气体管路、储气装置、加热装置、