Vacuum magnetron sputtering device with rotating function

The vacuum magnetron sputtering device with the rotating function comprises a shell, dust screens are installed at the bottoms of the two sides of the shell, a power interface is installed in the middle of the bottom of one end of the shell, and a shielding door is rotatably installed at the end, aw...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG HONGFEI, XIONG LANG, LIN MENGTIAN, ZHANG YEFANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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