Magnetron sputtering device convenient for replacing target material

The magnetron sputtering device comprises a supporting plate, a movable plate is installed at the bottom of one side of the supporting plate in a sliding mode, a target fixing device is rotatably installed in the middle of the top of the movable plate, a supporting frame is installed at the bottom of the movable plate, and the target fixing device is installed on the supporting frame. An electric cylinder is installed in the middle of the bottom of the supporting frame. The electric cylinder is arranged, if a worker needs to replace a target material on the supporting barrel, the worker controls the output quantity of the output end of the electric cylinder, so that the movable plate on the supporting frame can move along one side of the supporting plate, and then the target material is driven to move through movement of the movable plate; and a rotating connecting piece at the output end of a motor on the mounting plate is connected with a clamping groove box at the top of the supporting cylinder, so that th