Magnetron sputtering vacuum coating device

The magnetron sputtering vacuum coating device comprises a supporting frame, a movable box is movably installed on one side of the bottom end of the interior of the supporting frame, a storage box is installed at the bottom end of the interior of the movable box, and an inert gas tank is installed a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WANG HONGFEI, XIONG LANG, LIN MENGTIAN, ZHANG YEFANG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The magnetron sputtering vacuum coating device comprises a supporting frame, a movable box is movably installed on one side of the bottom end of the interior of the supporting frame, a storage box is installed at the bottom end of the interior of the movable box, and an inert gas tank is installed at the bottom end of the interior of the storage box; an electronic gas valve is installed at the output end of the inert gas tank, supporting rods are installed at the two ends of the other side of the movable box, a placing plate is installed at the tops of the supporting rods, and an electric box is installed on the side, away from the movable box, of the bottom end in the supporting frame. According to the magnetron sputtering device, due to the fact that the working assemblies at all positions on the magnetron sputtering device are directly installed on the supporting frame, it is avoided that a large amount of time is consumed when a worker assembles the magnetron sputtering device, and most of circuits betwee