Cleaning device of ICP atomizing chamber

Cleaning device of ICP atomizing chamber

The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SHI JIANGHUAN, ZHU XIAOLONG
Format: Patent
Sprache:chi ; eng
Schlagworte:
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SHI JIANGHUAN
ZHU XIAOLONG
description The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and circularly wash the ICP atomizing chamber, and a sample inlet end, a sample outlet end and a waste liquid end of the ICP atomizing chamber are simultaneously cleaned through the conversion tee joint. The risk of long-time contact of high-concentration strong acid in a traditional cleaning method is avoided, operation is easy, the cleaning efficiency is high, safety and no danger are achieved, and damage to the ICP atomizing chamber is avoided. Meanwhile, due to the fact that the filter is of a detachable and washable structure, cleaning dirt can be filtered, secondary pollution of the cleaning solution tank or the ultrapure water tank is avoided, a group of cleaning solutions can be repeatedly used, and the cleanin
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN217141586UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN217141586UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN217141586UU3</originalsourceid><addsrcrecordid>eNrjZNBwzklNzMvMS1dISS3LTE5VyE9T8HQOUEgsyc_NrAKJJ2ck5ialFvEwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknhnPyNDc0MTQ1MLs9BQY6IUAQDW1yhv</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Cleaning device of ICP atomizing chamber</title><source>esp@cenet</source><creator>SHI JIANGHUAN ; ZHU XIAOLONG</creator><creatorcontrib>SHI JIANGHUAN ; ZHU XIAOLONG</creatorcontrib><description>The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and circularly wash the ICP atomizing chamber, and a sample inlet end, a sample outlet end and a waste liquid end of the ICP atomizing chamber are simultaneously cleaned through the conversion tee joint. The risk of long-time contact of high-concentration strong acid in a traditional cleaning method is avoided, operation is easy, the cleaning efficiency is high, safety and no danger are achieved, and damage to the ICP atomizing chamber is avoided. Meanwhile, due to the fact that the filter is of a detachable and washable structure, cleaning dirt can be filtered, secondary pollution of the cleaning solution tank or the ultrapure water tank is avoided, a group of cleaning solutions can be repeatedly used, and the cleanin</description><language>chi ; eng</language><subject>CLEANING ; CLEANING IN GENERAL ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220809&amp;DB=EPODOC&amp;CC=CN&amp;NR=217141586U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220809&amp;DB=EPODOC&amp;CC=CN&amp;NR=217141586U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHI JIANGHUAN</creatorcontrib><creatorcontrib>ZHU XIAOLONG</creatorcontrib><title>Cleaning device of ICP atomizing chamber</title><description>The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and circularly wash the ICP atomizing chamber, and a sample inlet end, a sample outlet end and a waste liquid end of the ICP atomizing chamber are simultaneously cleaned through the conversion tee joint. The risk of long-time contact of high-concentration strong acid in a traditional cleaning method is avoided, operation is easy, the cleaning efficiency is high, safety and no danger are achieved, and damage to the ICP atomizing chamber is avoided. Meanwhile, due to the fact that the filter is of a detachable and washable structure, cleaning dirt can be filtered, secondary pollution of the cleaning solution tank or the ultrapure water tank is avoided, a group of cleaning solutions can be repeatedly used, and the cleanin</description><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBwzklNzMvMS1dISS3LTE5VyE9T8HQOUEgsyc_NrAKJJ2ck5ialFvEwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknhnPyNDc0MTQ1MLs9BQY6IUAQDW1yhv</recordid><startdate>20220809</startdate><enddate>20220809</enddate><creator>SHI JIANGHUAN</creator><creator>ZHU XIAOLONG</creator><scope>EVB</scope></search><sort><creationdate>20220809</creationdate><title>Cleaning device of ICP atomizing chamber</title><author>SHI JIANGHUAN ; ZHU XIAOLONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN217141586UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SHI JIANGHUAN</creatorcontrib><creatorcontrib>ZHU XIAOLONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHI JIANGHUAN</au><au>ZHU XIAOLONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Cleaning device of ICP atomizing chamber</title><date>2022-08-09</date><risdate>2022</risdate><abstract>The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and circularly wash the ICP atomizing chamber, and a sample inlet end, a sample outlet end and a waste liquid end of the ICP atomizing chamber are simultaneously cleaned through the conversion tee joint. The risk of long-time contact of high-concentration strong acid in a traditional cleaning method is avoided, operation is easy, the cleaning efficiency is high, safety and no danger are achieved, and damage to the ICP atomizing chamber is avoided. Meanwhile, due to the fact that the filter is of a detachable and washable structure, cleaning dirt can be filtered, secondary pollution of the cleaning solution tank or the ultrapure water tank is avoided, a group of cleaning solutions can be repeatedly used, and the cleanin</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN217141586UU
source esp@cenet
subjects CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
title Cleaning device of ICP atomizing chamber
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T12%3A27%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SHI%20JIANGHUAN&rft.date=2022-08-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN217141586UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true