Cleaning device of ICP atomizing chamber

The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHI JIANGHUAN, ZHU XIAOLONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The utility model discloses a cleaning device of an ICP atomizing chamber, the cleaning device comprises an ICP atomizing chamber, a conversion tee joint, a filter, a solution tank, a circulating pump and the like, the circulating pump is mainly utilized to drive cleaning solution to repeatedly and circularly wash the ICP atomizing chamber, and a sample inlet end, a sample outlet end and a waste liquid end of the ICP atomizing chamber are simultaneously cleaned through the conversion tee joint. The risk of long-time contact of high-concentration strong acid in a traditional cleaning method is avoided, operation is easy, the cleaning efficiency is high, safety and no danger are achieved, and damage to the ICP atomizing chamber is avoided. Meanwhile, due to the fact that the filter is of a detachable and washable structure, cleaning dirt can be filtered, secondary pollution of the cleaning solution tank or the ultrapure water tank is avoided, a group of cleaning solutions can be repeatedly used, and the cleanin