Epitaxial base and epitaxial equipment

The utility model provides an epitaxy base and epitaxy equipment, a first surface of the epitaxy base is provided with a bearing groove used for loading a wafer, the bottom wall of the bearing groove comprises a first contact part and a second contact part surrounding the first contact part, and the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PAN SHUAI, ZHANG BIN, CAO GONGBAI, YU DENGYONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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