Epitaxial base and epitaxial equipment

The utility model provides an epitaxy base and epitaxy equipment, a first surface of the epitaxy base is provided with a bearing groove used for loading a wafer, the bottom wall of the bearing groove comprises a first contact part and a second contact part surrounding the first contact part, and the first contact part is recessed in the second contact part relative to the wafer. The first contact part is in contact with the wafer when the epitaxial process is executed; the first contact part is provided with a plurality of first convex points or first concave pits which are distributed in an annular mode, and/or the second face of the epitaxial base is provided with a plurality of second convex points or second concave pits which are distributed in an annular mode. According to the utility model, the first convex points or the first pits are arranged on the first surface of the epitaxial substrate, and/or the second convex points or the second pits are arranged on the second surface of the epitaxial substrate