Device for treating plating assisting liquid

The utility model discloses a plating assistant liquid treatment device which comprises a first reaction tank, a second reaction tank arranged on one side of the first reaction tank, a press filter arranged on one side of the second reaction tank, a sedimentation tank arranged on one side of the pre...

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Bibliographische Detailangaben
Hauptverfasser:	MA LI, LYU CHUNGUI, YIN CHUNLONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	The utility model discloses a plating assistant liquid treatment device which comprises a first reaction tank, a second reaction tank arranged on one side of the first reaction tank, a press filter arranged on one side of the second reaction tank, a sedimentation tank arranged on one side of the press filter, a first top cover arranged on the top of the first reaction tank, and a second top cover arranged on the top of the second reaction tank. A first top cover is arranged at the top of the first reaction tank, a first liquid injection pipe is fixedly connected to one side of the first reaction tank, a first liquid discharge pipe is fixedly connected to the other side of the first reaction tank, a second top cover is arranged at the top of the second reaction tank, a second liquid injection pipe is fixedly connected to one side of the second reaction tank, and a second liquid discharge pipe is fixedly connected to the other side of the second reaction tank; one side of the press filter is fixedly connected w