Silicon carbide single crystal polished wafer drying device
The utility model relates to the field of silicon carbide wafer processing devices, in particular to a silicon carbide single crystal polished wafer drying device which comprises a box body, supporting frames and an adjusting hanging disc, a plurality of linear side-by-side supporting frames are arr...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to the field of silicon carbide wafer processing devices, in particular to a silicon carbide single crystal polished wafer drying device which comprises a box body, supporting frames and an adjusting hanging disc, a plurality of linear side-by-side supporting frames are arranged in the box body, horizontal rotating hanging shafts are arranged on the upper portions of the supporting frames, and the adjusting hanging disc is arranged on the rotating hanging shafts. A plurality of adjusting hanging discs are linearly arranged and hung on the rotating hanging shaft, a plurality of silicon carbide single crystal wafers are circumferentially arranged and hung on the adjusting hanging discs, a plurality of ventilation openings are formed in the box body, and the adjusting hanging discs, the supporting frame and the box body are matched to form a silicon carbide single crystal wafer airing structure. According to the device, the silicon carbide single crystal wafer can be rapidly dried by ad |
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