Rectification plate, fluid introduction device, and film formation device

Provided is a rectifying plate capable of suppressing fluctuations in film formation speed on an object to be subjected to film formation. According to one embodiment, a rectifying plate is provided so as to face a plurality of nozzles that eject a fluid, and has a plurality of high-flow-path-resistance regions that have nozzle-facing regions that respectively face the plurality of nozzles, the low-flow-path-resistance regions that have nozzle-facing regions that face the plurality of nozzles, and the high-flow-path-resistance regions that have nozzle-facing regions that face the plurality of nozzles, and the high-flow-path-resistance regions that have nozzle-facing regions that face the plurality of nozzles. And a plurality of first through-holes surrounding each of the plurality of high-flow-resistance regions, the plurality of first through-holes being formed, and the flow resistance of the first through-holes being smaller than that of the high-flow-resistance regions. 提供能够抑制向成膜对象物的成膜速度的变动的整流板。根据实施方式，整流板具