Plasma processing apparatus

The utility model provides plasma processing equipment. The plasma processing equipment comprises a radio frequency power supply module, the radio frequency power supply module comprises a first radio frequency power supply and a second radio frequency power supply which are connected in parallel, the plasma processing equipment further comprises a feed unit which is connected with the parallel power supplies in series and used for feeding after power supply superposition, the frequency of the first radio frequency power supply is very high frequency 30MHz-300MHz, and the frequency of the second radio frequency power supply is lower than that of the first radio frequency power supply. And the frequency of the second radio frequency power supply is lower than that of the first radio frequency power supply. According to the utility model, the standing wave effect can be inhibited, and the coating uniformity is improved. 本实用新型提供一种等离子体处理设备。所述等离子体处理设备包括射频电源模块，所述射频电源模块包括并联连接的第一射频电源以及第二射频电源，还包括与并联的电源串联连接且用于将其供电叠加后进行