Polishing device

A polishing device is used for polishing a product through a polishing solution and comprises a tank body provided with a polishing tank, the tank bottom of the polishing tank is concavely provided with an overflow tank, and the polishing tank and the overflow tank are used for containing the polish...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ZHANG DONGPING, ZHANG QUNWEN, XIAO HUAN, GAO WEI, YANG XIUGAO, SUO SHENGJIANG, ZHANG CHANGHONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	A polishing device is used for polishing a product through a polishing solution and comprises a tank body provided with a polishing tank, the tank bottom of the polishing tank is concavely provided with an overflow tank, and the polishing tank and the overflow tank are used for containing the polishing solution; the supporting frame is erected in the polishing groove and used for fixing the product; the polishing assembly is used for stretching into the polishing groove to be matched with polishing liquid to polish the product; and the air cushion is contained in the overflow groove, and the liquid level height of the polishing liquid is controlled by controlling the volume of the air cushion to be reduced or expanded. According to the polishing device, the liquid level height of the polishing liquid is controlled by controlling the volume of the air cushion to be reduced or expanded, so that when the polishing assembly is used for polishing the product, the polishing liquid in the polishing groove completely