Reduction cycle hydrogen cryogenic impurity removal device for producing high-quality polycrystalline silicon

The utility model relates to a reduction cycle hydrogen cryogenic purification device for producing high-quality polycrystalline silicon. The device comprises a borane removal adsorption column, a borane-hydrogen primary gas-gas heat exchanger, a borane-hydrogen secondary gas-gas heat exchanger, a b...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ZHANG MIAOLEI, WANG NAIZHI, ZHANG YU, HUANG GUOQIANG, HUANG QIQI
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The utility model relates to a reduction cycle hydrogen cryogenic purification device for producing high-quality polycrystalline silicon. The device comprises a borane removal adsorption column, a borane-hydrogen primary gas-gas heat exchanger, a borane-hydrogen secondary gas-gas heat exchanger, a borane deep freezer, a borane-hydrogen secondary gas-gas heat exchange split-phase tank, a borane deep cooling gas heat exchange split-phase tank, a borane-hydrogen chloride absorption tower and a borane-hydrogen chloride absorption tower gas inlet gas cooler, the system comprises a borane-hydrogen chloride absorption tower, a borane-hydrogen chloride absorption tower inlet gas precooler, a borane-hydrogen chloride-hydrogen desorption tower, a reduction tail gas condensate tank, an absorption tower feeding condensate tank, a reduction tail gas liquid cooler and an activated carbon adsorption tower. According to the main part of the device, a gas phase and a liquid phase separated after three-stage cooling of a mater