Vacuum plating winding prevention overturning tool for semiconductor laser production

The utility model discloses a vacuum anti-winding plating turnover tool for semiconductor laser production, which comprises a supporting mechanism, a loading clamp mechanism and a turnover mechanism, the supporting mechanism is connected with the loading clamp mechanism and the turnover mechanism, a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GU YANLIANG, ZHOU XUYAN, CHENG SHICONG, CHEN WENHE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES USING STIMULATED EMISSION DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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