Sealing ring and chemical mechanical polishing device comprising same
The utility model provides a sealing ring and a chemical mechanical polishing device comprising the same. The sealing ring is in a circular ring shape; the sealing ring sequentially comprises a first flat part, a first convex part and a second flat part from the outer ring to the inner ring; the fir...
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| creator | HUI HONGYE PAN JIE YAO LIJUN WANG XUEZE FAN XINGPO |
| description | The utility model provides a sealing ring and a chemical mechanical polishing device comprising the same. The sealing ring is in a circular ring shape; the sealing ring sequentially comprises a first flat part, a first convex part and a second flat part from the outer ring to the inner ring; the first convex part is an inverted U-shaped bulge, and the lower part of the inverted U-shaped bulge is hollow; a first groove is formed in the convex side, close to the first convex part, of the first flat part; the second flat part is connected with the end part of the first convex part through an arc groove; the sealing ring is provided with seven movable sealing rings, it can be guaranteed that the internal air pressure state of the grinding head is isolated from the outside in the chemical mechanical polishing process, and therefore the effect of precise grinding and polishing is achieved, the chemical mechanical polishing precision is improved through the chemical mechanical polishing device comprising the sealing |
| format | Patent |
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The sealing ring is in a circular ring shape; the sealing ring sequentially comprises a first flat part, a first convex part and a second flat part from the outer ring to the inner ring; the first convex part is an inverted U-shaped bulge, and the lower part of the inverted U-shaped bulge is hollow; a first groove is formed in the convex side, close to the first convex part, of the first flat part; the second flat part is connected with the end part of the first convex part through an arc groove; the sealing ring is provided with seven movable sealing rings, it can be guaranteed that the internal air pressure state of the grinding head is isolated from the outside in the chemical mechanical polishing process, and therefore the effect of precise grinding and polishing is achieved, the chemical mechanical polishing precision is improved through the chemical mechanical polishing device comprising the sealing</description><language>chi ; eng</language><subject>BLASTING ; CYLINDERS ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ENGINEERING ELEMENTS AND UNITS ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; GRINDING ; HEATING ; LIGHTING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MECHANICAL ENGINEERING ; PERFORMING OPERATIONS ; PISTONS ; POLISHING ; SEALINGS ; THERMAL INSULATION IN GENERAL ; TRANSPORTING ; WEAPONS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211210&DB=EPODOC&CC=CN&NR=215110516U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211210&DB=EPODOC&CC=CN&NR=215110516U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HUI HONGYE</creatorcontrib><creatorcontrib>PAN JIE</creatorcontrib><creatorcontrib>YAO LIJUN</creatorcontrib><creatorcontrib>WANG XUEZE</creatorcontrib><creatorcontrib>FAN XINGPO</creatorcontrib><title>Sealing ring and chemical mechanical polishing device comprising same</title><description>The utility model provides a sealing ring and a chemical mechanical polishing device comprising the same. The sealing ring is in a circular ring shape; the sealing ring sequentially comprises a first flat part, a first convex part and a second flat part from the outer ring to the inner ring; the first convex part is an inverted U-shaped bulge, and the lower part of the inverted U-shaped bulge is hollow; a first groove is formed in the convex side, close to the first convex part, of the first flat part; the second flat part is connected with the end part of the first convex part through an arc groove; the sealing ring is provided with seven movable sealing rings, it can be guaranteed that the internal air pressure state of the grinding head is isolated from the outside in the chemical mechanical polishing process, and therefore the effect of precise grinding and polishing is achieved, the chemical mechanical polishing precision is improved through the chemical mechanical polishing device comprising the sealing</description><subject>BLASTING</subject><subject>CYLINDERS</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>GRINDING</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MECHANICAL ENGINEERING</subject><subject>PERFORMING OPERATIONS</subject><subject>PISTONS</subject><subject>POLISHING</subject><subject>SEALINGS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHANTk3MycxLVygCEYl5KQrJGam5mcmJOQq5qckZiXlgZkF-TmZxBkhFSmpZZnKqQnJ-bkFRZjFIpDgxN5WHgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsQ7-xkZmhoaGpgamoWGGhOlCABReDPr</recordid><startdate>20211210</startdate><enddate>20211210</enddate><creator>HUI HONGYE</creator><creator>PAN JIE</creator><creator>YAO LIJUN</creator><creator>WANG XUEZE</creator><creator>FAN XINGPO</creator><scope>EVB</scope></search><sort><creationdate>20211210</creationdate><title>Sealing ring and chemical mechanical polishing device comprising same</title><author>HUI HONGYE ; PAN JIE ; YAO LIJUN ; WANG XUEZE ; FAN XINGPO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN215110516UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>BLASTING</topic><topic>CYLINDERS</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>GRINDING</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MECHANICAL ENGINEERING</topic><topic>PERFORMING OPERATIONS</topic><topic>PISTONS</topic><topic>POLISHING</topic><topic>SEALINGS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>HUI HONGYE</creatorcontrib><creatorcontrib>PAN JIE</creatorcontrib><creatorcontrib>YAO LIJUN</creatorcontrib><creatorcontrib>WANG XUEZE</creatorcontrib><creatorcontrib>FAN XINGPO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HUI HONGYE</au><au>PAN JIE</au><au>YAO LIJUN</au><au>WANG XUEZE</au><au>FAN XINGPO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Sealing ring and chemical mechanical polishing device comprising same</title><date>2021-12-10</date><risdate>2021</risdate><abstract>The utility model provides a sealing ring and a chemical mechanical polishing device comprising the same. 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| language | chi ; eng |
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| subjects | BLASTING CYLINDERS DRESSING OR CONDITIONING OF ABRADING SURFACES ENGINEERING ELEMENTS AND UNITS FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS GRINDING HEATING LIGHTING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MECHANICAL ENGINEERING PERFORMING OPERATIONS PISTONS POLISHING SEALINGS THERMAL INSULATION IN GENERAL TRANSPORTING WEAPONS |
| title | Sealing ring and chemical mechanical polishing device comprising same |
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