Layout structure

The utility model provides a layout structure and a semiconductor device. The mask pattern is used for partially covering the feature pattern so as to define the effective regular pattern in the feature pattern, and at least the first boundary of the mask pattern correspondingly extends according to the arrangement of the regular pattern, so that the exposure degree of the effective regular pattern is improved, and the covering degree of the ineffective regular pattern is correspondingly guaranteed. When the layout structure is applied to the preparation of the semiconductor device, the morphology of the formed opening corresponding to the effective regular pattern is more complete. 本实用新型提供了一种版图结构及半导体器件。利用掩模图案对特征图案进行部分遮盖，以将特征图案中的有效规则图形界定出，并且掩模图案的至少第一边界是顺应规则图形的排布而对应延伸，提高了对有效规则图形的暴露度，并相应的保障对无效规则图形的遮盖程度。在将该版图结构应用于半导体器件的制备中时，则所形成的对应于有效规则图形的开孔的形貌也更加完整。