Supporting device of substrate and PECVD (plasma enhanced chemical vapor deposition) equipment

The utility model provides a substrate supporting device and PECVD (plasma enhanced chemical vapor deposition) equipment, the substrate supporting device comprises a base and a liftable supporting mechanism matched with the base, the base is provided with a plurality of through holes, and first magnetic pieces are nested on the inner side walls of the through holes; the supporting mechanism comprises a plurality of supporting pieces, second magnetic pieces with the same magnetism as the first magnetic pieces are arranged on the supporting pieces, the supporting pieces and the through holes are arranged in a one-to-one correspondence mode, so that the top ends of the supporting pieces can extend to the surface of the base through the through holes, and gaps are kept between the outer side walls of the supporting pieces and the inner side walls of the through holes. According to the supporting device of the substrate and the PECVD equipment provided by the utility model, particles generated by friction between