Sputtering cathode gas uniformizing device

The utility model discloses a sputtering cathode gas uniformizing device which comprises a sputtering cathode installed on a cathode target door and a cathode baffle covering the sputtering cathode, and two or more sections of independent gas uniformizing pipes which are not communicated are symmetrically arranged on the inner side of the cathode baffle and on the two edges of the sputtering cathode in the length direction of the sputtering cathode. Wherein the gas uniformizing pipe is composed of a gas uniformizing outer pipe and a gas uniformizing inner pipe, the gas uniformizing inner pipeis sleeved with the gas uniformizing outer pipe and connected with the gas inlet pipeline, the gas inlet pipeline penetrates through the cathode target door and is connected with the gas flow controller, gas outlet holes are distributed in the periphery of the wall of the gas uniformizing inner pipe, and a plurality of gas outlet nozzles are distributed on the gas uniformizing outer pipe in the length direction. The gas h