Polycrystalline silicon wafer surface leaching device

The utility model discloses a polycrystalline silicon wafer surface leaching device which comprises an outer frame, a motor seat, a bearing seat, a motor, a rotating shaft, a cam, a lifting frame, a polycrystalline silicon wafer fixing frame, a leaching nozzle, a water storage tank and a base, the outer frame is in threaded connection with the middle of the base, the two sides of the outer frame are provided with the motor base and the bearing base, the motor is arranged on the motor base, one end of the rotating shaft penetrates through the bearing base, the rotating shaft is provided with the two cams, the two cams drive the two lifting frames to ascend and descend alternately, the polycrystalline silicon wafers are fixed through the polycrystalline silicon wafer fixing frame, and the polycrystalline silicon wafers overturn alternately along with alternate ascending and descending of the two lifting frames. The leaching nozzle penetrates through the left side wall and the right sidewall of the outer frame,