Novel exposure system

The utility model provides a novel exposure system. The novel exposure system comprises a first wafer, a first wafer sucker, a second wafer, a second wafer sucker, a distributed illumination light source, a length measurement mechanism, a spacer ball, a wafer alignment mechanism, a driving mechanism, a controller and a computer. The distance between the first wafer and the second wafer is precisely adjusted through the wafer alignment mechanism, only the sub-illumination areas are used for exposing the photoresist areas within the preset depth-of-field range every time through the distributedillumination light sources, multiple times of exposure can be achieved, and the production efficiency is greatly improved. Through reading of the length meter, the distance between the first wafer andthe second wafer can be accurately controlled, the wafer alignment precision and the exposure resolution are improved, and the method can be suitable for manufacturing semiconductor assemblies with smaller sizes. 本实用新型提供一种新型曝