Wafer cleaning equipment

The utility model relates to wafer cleaning equipment. Wherein the wafer conveying device, the first supporting and positioning device, the second supporting and positioning device, the wafer detection device and the wafer cleaning device are installed above the rack. The wafer cleaning device compr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CAI DANCHUN, CHEN TIANHU, ZHENG JUN, LI YUZHOU
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The utility model relates to wafer cleaning equipment. Wherein the wafer conveying device, the first supporting and positioning device, the second supporting and positioning device, the wafer detection device and the wafer cleaning device are installed above the rack. The wafer cleaning device comprises a cleaning support frame, an X-axis moving module, a Y-axis moving module, a moving plate, a lifting cylinder, a rod mounting block and a dust sticking rod, the X-axis moving module drives the Y-axis moving module to move left and right along the X axis; the Y-axis moving module drives the moving plate to move back and forth along the Y axis; a lifting cylinder is mounted beside the moving plate; the lifting cylinder drives the rod mounting block to lift up and down; compared with the priorart, the wafer cleaning device has the advantages that the dust sticking rod is adopted to remove dust and foreign matters on the surface of the wafer, the dust sticking rod cannot damage and pollutethe wafer, the use, maint