Magnetron sputtering target with detection device
The utility model discloses a magnetron sputtering target with a detection device. The device comprises a vacuum cavity, a target material, a target seat, a connecting seat and a water-cooling back plate, a target seat is mounted in the center of the bottom of the vacuum cavity; connecting bases are...
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| creator | SUN YANSHAN |
| description | The utility model discloses a magnetron sputtering target with a detection device. The device comprises a vacuum cavity, a target material, a target seat, a connecting seat and a water-cooling back plate, a target seat is mounted in the center of the bottom of the vacuum cavity; connecting bases are fixed to the two inner side walls of the bottom of the vacuum cavity correspondingly. One end of the connecting seat is in contact with the outer wall of the target seat; a mounting structure is arranged on the outer wall of the target seat below the connecting seat; a target material is installedat the top end in the target base, a water-cooling back plate is installed in the target base below the target material, circulation pipe grooves are formed in the two sides of the bottom end of the water-cooling back plate, the bottom ends of the circulation pipe grooves extend out of the target base, plugs are installed in the centers of the bottom ends of the circulation pipe grooves, and an alarm is installed in the c |
| format | Patent |
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The device comprises a vacuum cavity, a target material, a target seat, a connecting seat and a water-cooling back plate, a target seat is mounted in the center of the bottom of the vacuum cavity; connecting bases are fixed to the two inner side walls of the bottom of the vacuum cavity correspondingly. One end of the connecting seat is in contact with the outer wall of the target seat; a mounting structure is arranged on the outer wall of the target seat below the connecting seat; a target material is installedat the top end in the target base, a water-cooling back plate is installed in the target base below the target material, circulation pipe grooves are formed in the two sides of the bottom end of the water-cooling back plate, the bottom ends of the circulation pipe grooves extend out of the target base, plugs are installed in the centers of the bottom ends of the circulation pipe grooves, and an alarm is installed in the c</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; METALLURGY ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201002&DB=EPODOC&CC=CN&NR=211620607U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201002&DB=EPODOC&CC=CN&NR=211620607U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUN YANSHAN</creatorcontrib><title>Magnetron sputtering target with detection device</title><description>The utility model discloses a magnetron sputtering target with a detection device. The device comprises a vacuum cavity, a target material, a target seat, a connecting seat and a water-cooling back plate, a target seat is mounted in the center of the bottom of the vacuum cavity; connecting bases are fixed to the two inner side walls of the bottom of the vacuum cavity correspondingly. One end of the connecting seat is in contact with the outer wall of the target seat; a mounting structure is arranged on the outer wall of the target seat below the connecting seat; a target material is installedat the top end in the target base, a water-cooling back plate is installed in the target base below the target material, circulation pipe grooves are formed in the two sides of the bottom end of the water-cooling back plate, the bottom ends of the circulation pipe grooves extend out of the target base, plugs are installed in the centers of the bottom ends of the circulation pipe grooves, and an alarm is installed in the c</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD0TUzPSy0pys9TKC4oLSlJLcrMS1coSSxKTy1RKM8syVBISS1JTS7JBCpISS3LTE7lYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyalAA-Od_YwMDc2MDMwMzENDjYlSBAAvRizw</recordid><startdate>20201002</startdate><enddate>20201002</enddate><creator>SUN YANSHAN</creator><scope>EVB</scope></search><sort><creationdate>20201002</creationdate><title>Magnetron sputtering target with detection device</title><author>SUN YANSHAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN211620607UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SUN YANSHAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUN YANSHAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Magnetron sputtering target with detection device</title><date>2020-10-02</date><risdate>2020</risdate><abstract>The utility model discloses a magnetron sputtering target with a detection device. The device comprises a vacuum cavity, a target material, a target seat, a connecting seat and a water-cooling back plate, a target seat is mounted in the center of the bottom of the vacuum cavity; connecting bases are fixed to the two inner side walls of the bottom of the vacuum cavity correspondingly. One end of the connecting seat is in contact with the outer wall of the target seat; a mounting structure is arranged on the outer wall of the target seat below the connecting seat; a target material is installedat the top end in the target base, a water-cooling back plate is installed in the target base below the target material, circulation pipe grooves are formed in the two sides of the bottom end of the water-cooling back plate, the bottom ends of the circulation pipe grooves extend out of the target base, plugs are installed in the centers of the bottom ends of the circulation pipe grooves, and an alarm is installed in the c</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING |
| title | Magnetron sputtering target with detection device |
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