Chemical liquid concentration control device for silicon polished wafer cleaning machine

The utility model discloses a chemical liquid concentration control device for a silicon polished wafer cleaning machine. The device comprises a cleaning tank, a circulating pipeline and a liquid supplementing pipeline which are communicated pairwise, wherein the cleaning tank is composed of an inner tank and an outer tank which are arranged in an embedded mode, the circulating pipeline is composed of a circulating pump, a filter and a heater, the liquid supplementing pipeline is composed of an ammonia water concentration meter, a hydrogen peroxide concentration meter, a control module, an ammonia water metering pump and a hydrogen peroxide metering pump, and outlet pipelines of the ammonia water metering pump and the hydrogen peroxide metering pump are connected into the inner tank; the device can accurately and effectively control the concentration of chemicals in the cleaning liquid, achieves excellent removal efficiency and product quality of particle impurities on the surface of the silicon wafer, improv