Arsenic removal device for gallium arsenide wafer production and processing wastewater
The utility model discloses an arsenic removal device for gallium arsenide wafer production and processing wastewater. The device comprises a filter tank, a reaction cylinder and a sedimentation tankI, the right lower end of the filter tank is connected with the left upper end of the reaction cylind...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses an arsenic removal device for gallium arsenide wafer production and processing wastewater. The device comprises a filter tank, a reaction cylinder and a sedimentation tankI, the right lower end of the filter tank is connected with the left upper end of the reaction cylinder; the right lower end of the reaction cylinder is communicated with the left upper end of the sedimentation tank I; a drain outlet I is formed in the lower end of the right side of the settling pond I; a blow-down valve is mounted at the blow-down port I; the right upper end of the sedimentationtank I is communicated with the left upper end of the sedimentation tank II; the right upper end of the sedimentation tank II communicates with a clean water tank; during use, the lifting pump I is started, wastewater filtered in the filter tank is pumped into the reaction cylinder, lime milk and ferric salt are added from the feeding hole to neutralize the wastewater, the motor is started to drive the stirring shaft and t |
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