Plasma device used after film coating

The utility model relates to a plasma device used after film coating. The cleaning device comprises a cleaning machine and a plasma device, a cleaning box and a material plate are arranged on the cleaning machine; the material plate penetrates through one end of the cleaning box and extends out of t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YAN CONGGANG, BAI QINGSHI, LIANG GAOWEI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The utility model relates to a plasma device used after film coating. The cleaning device comprises a cleaning machine and a plasma device, a cleaning box and a material plate are arranged on the cleaning machine; the material plate penetrates through one end of the cleaning box and extends out of the other end of the cleaning box to form a feeding port and a discharging port, the plasma device islocated at the feeding port of the material plate, idler wheels are installed below the material plate, and two sets of rolling brushes and air knives used for cleaning products passing through the lower portion of the cleaning box are installed at the position, located above the material plate, of the cleaning box. According to the technical scheme, the flat plate cleaning machine is additionally arranged, the operation process is simplified, the production efficiency is high, and the dyne value improvement effect is good. 本实用新型涉及一种用于镀膜后的等离子装置,它包括:清洗机以及等离子装置,清洗机上设有清洗箱以及料板,料板自清洗箱的一端穿过并延伸至该清洗箱的另一端外构成上料口以及出料口,等离子装置位于料板