Device for preparing manganese-silicon alloy by utilizing manganese-rich slag
The utility model discloses a device for preparing manganese-silicon alloy by utilizing manganese-rich slag. The device comprises a submerged arc furnace, an inert gas storage tank and a gas filteringdevice, the submerged arc furnace comprises an outer shell and a top cover, a crucible, a graphite e...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses a device for preparing manganese-silicon alloy by utilizing manganese-rich slag. The device comprises a submerged arc furnace, an inert gas storage tank and a gas filteringdevice, the submerged arc furnace comprises an outer shell and a top cover, a crucible, a graphite electrode and a driving device are arranged in the outer shell, a groove position is formed in the bottom of the crucible, the graphite electrode is annular, the graphite electrode is located in the groove position, and the driving device is located below the crucible; the top cover is located abovethe outer shell, a gas inlet pipe and a gas outlet pipe are arranged on the top cover, the gas inlet pipe is communicated with the inert gas storage tank, a first pump body is arranged on a pipelinebetween the gas inlet pipe and the inert gas storage tank, the gas outlet pipe is communicated with the gas filtering device, and a second pump body is arranged on a pipeline between the gas outlet pipe and the gas filtering de |
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