Wafer wiping brush device for silicon polished wafer wiping and cleaning machine

The utility model provides a wafer wiping brush device for a silicon polished wafer wiping and cleaning machine. The cleaning brush comprises a brush body, a water inlet mechanism and a driving mechanism, the water inlet mechanism and the driving mechanism are arranged on the brush body, the brush b...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: XIONG CHENGLEI, SHAO QI
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The utility model provides a wafer wiping brush device for a silicon polished wafer wiping and cleaning machine. The cleaning brush comprises a brush body, a water inlet mechanism and a driving mechanism, the water inlet mechanism and the driving mechanism are arranged on the brush body, the brush body comprises a first brush body and a second brush body, the second brush body is cylindrical sponge, a plurality of grooves are formed in the outer wall of the first brush body, a plurality of through holes are formed in the bottoms of the grooves, and the first brush body is connected with the water inlet mechanism and the driving mechanism through stepped holes; the water inlet mechanism comprises a connector and a water inlet column, and ultrapure water flows into an inner cavity of the first brush body through the water inlet column and the connector; the driving mechanism comprises a motor and a coupler connected to the motor, and the coupler is arranged in a stepped hole in the otherend of the first brush b