Shielding structure and plasma processing apparatus including same

The utility model relates to a shielding structure body and a plasma processing device comprising the shielding structure body, the shielding structure body is configured to surround the side part ofan electrostatic chuck used for placing a substrate, the shielding structure body comprises a first shielding unit, a second shielding unit, a third shielding unit and a third shielding unit, the first shielding unit is adjacent to one side of the electrostatic chuck; a second shielding unit disposed adjacent to the other side of the electrostatic chuck; and a first dielectric block between the first shielding unit and the second shielding unit. 本实用新型涉及一种屏蔽结构体以及包含该屏蔽结构体的等离子体处理装置，所述屏蔽结构体被配置成围绕用于放置基板的静电吸盘的侧部，其包括：第一屏蔽单元，与静电吸盘的一侧相邻地配置；第二屏蔽单元，与所述静电吸盘的另一侧相邻地配置；以及第一介电块，位于所述第一屏蔽单元与所述第二屏蔽单元之间。