Wafer cleaning device

The utility model relates to a wafer cleaning device. The device comprises a first conveying belt, conveying belt II, mounting rack I, mounting rack II, the first conveying belt is installed on the first installation frame. the conveying belt II is mounted on the mounting frame II; a rotating shaft...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LIU WENYUE, GE SIHE, DENG TIANJIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The utility model relates to a wafer cleaning device. The device comprises a first conveying belt, conveying belt II, mounting rack I, mounting rack II, the first conveying belt is installed on the first installation frame. the conveying belt II is mounted on the mounting frame II; a rotating shaft I is mounted on the mounting frame I; rotating shaft II and rotating shaft III, cleaning rollers aremounted on the rotating shaft I, the rotating shaft II and the rotating shaft III; a rotating shaft IV is mounted on the mounting frame II; rotating shaft V and rotating shaft VI, rotating shaft IV,a first conveying pipe is arranged above the first installation frame, a first nozzle is arranged on the first conveying pipe, a second conveying pipe is arranged above the second installation frame,a second nozzle is arranged on the second conveying pipe, a first bearing plate is installed on the first installation frame, and a second bearing plate is installed on the second installation frame.Through the arrangement of t