Work piece carrier, be used for bearing static base plate carrier and plasma processing cavity of silicon wafer

This discloses the content and relates to a work piece carrier, static base plate carrier and plasma processing cavity that is used for bearing the silicon wafer. A base plate carrier that in the aspect of the thermal stress be balanced, have a contact is described. In an example, the work piece carrier has: the rigidity base plate, the rigidity base plate is used for supporting entertaining to carry by the configuration and carries out the work piece handled, first dielectric layer on the base plate, static conductive electrode on the first dielectric layer, static conductive electrode is used for static to keep the work piece of entertaining and carrying, second dielectric layer on the electrode, the second dielectric layer is used for making the work piece with the electrode electricalisolation, and the third dielectric layer of base plate below, the third dielectric layer is used for offsetting is applyed by first dielectric layer and second dielectric layer the thermal stress ofbase plate. 本公开内容涉及种工件载体、种