Can prepare nano -imprint device of complicated micro -structure

The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHEMING ZHANG, YAN ZHOU, GONGCHENG ZHENG, JINGPENG LI, DIANZHENG WANG, JIN ZHANG, ZISU XU, BIN FU, YANPING ZHENG, KAITUO FENG, XINYU CANG, DEEN DAI, ZHENGFA YI, QUN ZHANG, YAN GU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!