Can prepare nano -imprint device of complicated micro -structure

The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats the photosensitive resist to glass temperature, roller platen no. 1 carries out the impression, thensolidification, later clear away remaining layer through etching device, the printing device below is got back to once more to the substrate, heat again, the rotary disk changes the photosensitive resist top to the impression for the first time after with roller platen no. 2, roller platen binary row impression, after two impressions of roller platen are accomplished, after three impressions of step to roller platen are accomplished more than repeating, the substrate of the complicated micro -structure that will obtain is again collected through the wind -up roll. The utility model disclosesa complicated micro -struc