Can prepare nano -imprint device of complicated micro -structure
The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats...
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| creator | ZHEMING ZHANG YAN ZHOU GONGCHENG ZHENG JINGPENG LI DIANZHENG WANG JIN ZHANG ZISU XU BIN FU YANPING ZHENG KAITUO FENG XINYU CANG DEEN DAI ZHENGFA YI QUN ZHANG YAN GU |
| description | The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats the photosensitive resist to glass temperature, roller platen no. 1 carries out the impression, thensolidification, later clear away remaining layer through etching device, the printing device below is got back to once more to the substrate, heat again, the rotary disk changes the photosensitive resist top to the impression for the first time after with roller platen no. 2, roller platen binary row impression, after two impressions of roller platen are accomplished, after three impressions of step to roller platen are accomplished more than repeating, the substrate of the complicated micro -structure that will obtain is again collected through the wind -up roll. The utility model disclosesa complicated micro -struc |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN207704188UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN207704188UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN207704188UU3</originalsourceid><addsrcrecordid>eNqNyj0KwkAQBtA0FqLeYbAPxB9IysCiWFmZOgyTL7CQ3R1mN55fCw9g9Zq3rXrHkdSgbKDIMVHtg5qPhSa8vYDSTJKCLl64YKLgxb4pF1ulrIZ9tZl5yTj83FXH--3lHjU0jcjKgogyuue5advmeuq6Ybj8lT4GczHk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Can prepare nano -imprint device of complicated micro -structure</title><source>esp@cenet</source><creator>ZHEMING ZHANG ; YAN ZHOU ; GONGCHENG ZHENG ; JINGPENG LI ; DIANZHENG WANG ; JIN ZHANG ; ZISU XU ; BIN FU ; YANPING ZHENG ; KAITUO FENG ; XINYU CANG ; DEEN DAI ; ZHENGFA YI ; QUN ZHANG ; YAN GU</creator><creatorcontrib>ZHEMING ZHANG ; YAN ZHOU ; GONGCHENG ZHENG ; JINGPENG LI ; DIANZHENG WANG ; JIN ZHANG ; ZISU XU ; BIN FU ; YANPING ZHENG ; KAITUO FENG ; XINYU CANG ; DEEN DAI ; ZHENGFA YI ; QUN ZHANG ; YAN GU</creatorcontrib><description>The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats the photosensitive resist to glass temperature, roller platen no. 1 carries out the impression, thensolidification, later clear away remaining layer through etching device, the printing device below is got back to once more to the substrate, heat again, the rotary disk changes the photosensitive resist top to the impression for the first time after with roller platen no. 2, roller platen binary row impression, after two impressions of roller platen are accomplished, after three impressions of step to roller platen are accomplished more than repeating, the substrate of the complicated micro -structure that will obtain is again collected through the wind -up roll. The utility model disclosesa complicated micro -struc</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180807&DB=EPODOC&CC=CN&NR=207704188U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180807&DB=EPODOC&CC=CN&NR=207704188U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHEMING ZHANG</creatorcontrib><creatorcontrib>YAN ZHOU</creatorcontrib><creatorcontrib>GONGCHENG ZHENG</creatorcontrib><creatorcontrib>JINGPENG LI</creatorcontrib><creatorcontrib>DIANZHENG WANG</creatorcontrib><creatorcontrib>JIN ZHANG</creatorcontrib><creatorcontrib>ZISU XU</creatorcontrib><creatorcontrib>BIN FU</creatorcontrib><creatorcontrib>YANPING ZHENG</creatorcontrib><creatorcontrib>KAITUO FENG</creatorcontrib><creatorcontrib>XINYU CANG</creatorcontrib><creatorcontrib>DEEN DAI</creatorcontrib><creatorcontrib>ZHENGFA YI</creatorcontrib><creatorcontrib>QUN ZHANG</creatorcontrib><creatorcontrib>YAN GU</creatorcontrib><title>Can prepare nano -imprint device of complicated micro -structure</title><description>The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats the photosensitive resist to glass temperature, roller platen no. 1 carries out the impression, thensolidification, later clear away remaining layer through etching device, the printing device below is got back to once more to the substrate, heat again, the rotary disk changes the photosensitive resist top to the impression for the first time after with roller platen no. 2, roller platen binary row impression, after two impressions of roller platen are accomplished, after three impressions of step to roller platen are accomplished more than repeating, the substrate of the complicated micro -structure that will obtain is again collected through the wind -up roll. The utility model disclosesa complicated micro -struc</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyj0KwkAQBtA0FqLeYbAPxB9IysCiWFmZOgyTL7CQ3R1mN55fCw9g9Zq3rXrHkdSgbKDIMVHtg5qPhSa8vYDSTJKCLl64YKLgxb4pF1ulrIZ9tZl5yTj83FXH--3lHjU0jcjKgogyuue5advmeuq6Ybj8lT4GczHk</recordid><startdate>20180807</startdate><enddate>20180807</enddate><creator>ZHEMING ZHANG</creator><creator>YAN ZHOU</creator><creator>GONGCHENG ZHENG</creator><creator>JINGPENG LI</creator><creator>DIANZHENG WANG</creator><creator>JIN ZHANG</creator><creator>ZISU XU</creator><creator>BIN FU</creator><creator>YANPING ZHENG</creator><creator>KAITUO FENG</creator><creator>XINYU CANG</creator><creator>DEEN DAI</creator><creator>ZHENGFA YI</creator><creator>QUN ZHANG</creator><creator>YAN GU</creator><scope>EVB</scope></search><sort><creationdate>20180807</creationdate><title>Can prepare nano -imprint device of complicated micro -structure</title><author>ZHEMING ZHANG ; YAN ZHOU ; GONGCHENG ZHENG ; JINGPENG LI ; DIANZHENG WANG ; JIN ZHANG ; ZISU XU ; BIN FU ; YANPING ZHENG ; KAITUO FENG ; XINYU CANG ; DEEN DAI ; ZHENGFA YI ; QUN ZHANG ; YAN GU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN207704188UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHEMING ZHANG</creatorcontrib><creatorcontrib>YAN ZHOU</creatorcontrib><creatorcontrib>GONGCHENG ZHENG</creatorcontrib><creatorcontrib>JINGPENG LI</creatorcontrib><creatorcontrib>DIANZHENG WANG</creatorcontrib><creatorcontrib>JIN ZHANG</creatorcontrib><creatorcontrib>ZISU XU</creatorcontrib><creatorcontrib>BIN FU</creatorcontrib><creatorcontrib>YANPING ZHENG</creatorcontrib><creatorcontrib>KAITUO FENG</creatorcontrib><creatorcontrib>XINYU CANG</creatorcontrib><creatorcontrib>DEEN DAI</creatorcontrib><creatorcontrib>ZHENGFA YI</creatorcontrib><creatorcontrib>QUN ZHANG</creatorcontrib><creatorcontrib>YAN GU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHEMING ZHANG</au><au>YAN ZHOU</au><au>GONGCHENG ZHENG</au><au>JINGPENG LI</au><au>DIANZHENG WANG</au><au>JIN ZHANG</au><au>ZISU XU</au><au>BIN FU</au><au>YANPING ZHENG</au><au>KAITUO FENG</au><au>XINYU CANG</au><au>DEEN DAI</au><au>ZHENGFA YI</au><au>QUN ZHANG</au><au>YAN GU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Can prepare nano -imprint device of complicated micro -structure</title><date>2018-08-07</date><risdate>2018</risdate><abstract>The utility model provides a can prepare nano -imprint device of complicated micro -structure, it emits the substrate at first to unreel the roller, the glue spreader is scribbled the photosensitive resist on the substrate, convey the printing device below with the substrate, the warming mill heats the photosensitive resist to glass temperature, roller platen no. 1 carries out the impression, thensolidification, later clear away remaining layer through etching device, the printing device below is got back to once more to the substrate, heat again, the rotary disk changes the photosensitive resist top to the impression for the first time after with roller platen no. 2, roller platen binary row impression, after two impressions of roller platen are accomplished, after three impressions of step to roller platen are accomplished more than repeating, the substrate of the complicated micro -structure that will obtain is again collected through the wind -up roll. The utility model disclosesa complicated micro -struc</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Can prepare nano -imprint device of complicated micro -structure |
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