Substrate tray storage chamber and MOCVD processing system

The utility model provides a substrate tray storage chamber for MOCVD processing system, substrate tray storage intracavity includes: the first support frame and the second support frame that stack about a plurality of wherein are provided with the coolant liquid pipeline and are used for cooling off the substrate tray that sets up on the second support frame in the second support frame, a plurality of second support frames are fixed to be arrived substrate storage chamber to at least one second support frame top has the space that is greater than second height (H0), a plurality of first support frames are connected to the storage chamber through drive arrangement, drive arrangement can drive a plurality of first support frame up -and -down motions for interval between two at least adjacent first support frames first height (H3) and change between the second height, wherein first height is less than the second height. 本实用新型提供种用于MOCVD处理系统的基片托盘存储腔，所述基片托盘存储腔内包括：多个上下叠放的第支撑架和第二支撑架，其中第二支撑架中设置有冷却液管道用以冷却设置在第二支撑架上的基片托