Drum type magnetron sputtering system

The utility model relates to an is plasma technology and aim at the ion with the film of metal, semiconductor, dielectric and compound plasma deposition is to the solid surface. The technique effect:shorten the regulation time, improve and adjust the precision and simplify drum type magnetron sputte...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SERGEI PAVLOVICH MARYSHEV, VITALI VLADIMIROVICH MIHALKOVICH, ALEKSANDR ALEKSEEVICH YASUNAS
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model relates to an is plasma technology and aim at the ion with the film of metal, semiconductor, dielectric and compound plasma deposition is to the solid surface. The technique effect:shorten the regulation time, improve and adjust the precision and simplify drum type magnetron sputtering system's design. Drum type magnetron sputtering system is including sputtering the unit, itsmagnetic system that has the stay tube and install the magnetic system on the stay tube. A detachable connecting part for inciting somebody to action the unit that the cavity was fastened in the magnetron sputtering system includes aotration clamping mechanism driving shaft and the fixed axle that has set screw, the guide portion of magnetic system is equipped with between fixed axle and the staytube the one end of fixed axle includes the tooth rifling and the detachable connecting part guide portion of magnetic system, between fixed axle and the stay tube uses the fluting clutch that has thefluting surface to form to t