Etching device
The utility model relates to an etching device, include the organism and absorb water the mechanism, the mechanism's setting that absorbs water is in in the organism, still include fan and vapour and liquid separator, absorb water the mechanism with the vapour and liquid separator pipe connecti...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to an etching device, include the organism and absorb water the mechanism, the mechanism's setting that absorbs water is in in the organism, still include fan and vapour and liquid separator, absorb water the mechanism with the vapour and liquid separator pipe connection, vapour and liquid separator with fan pipeline connects. The utility model discloses a but etching device the energy can be saved and the improvement evacuation efficiency that can show improve the homogeneity and the etching speed of etching.
本实用新型涉及种蚀刻装置,包括机体和吸水机构,所述吸水机构设置在所述机体内,还包括风机和气液分离器,所述吸水机构与所述气液分离器管道连接,所述气液分离器与所述风机管道连接。本实用新型的蚀刻装置可节省能源且可显著的提高抽真空效率,提高蚀刻的均匀性和蚀刻速度。 |
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