Target gas circuit of big broad width flexible parent metal magnetron sputtering filming equipment

The utility model belongs to the technical field of magnetron sputtering equipment technique and specifically relates to a target gas circuit that the magnetron sputtering equipment of the big broad width of coating film on the flexible parent metal. The utility model provides a let gas uniform dist...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LI GUOZENG, DENG HENGTAO, YANG YANG, LING FENG, KONG QINGYUE
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The utility model belongs to the technical field of magnetron sputtering equipment technique and specifically relates to a target gas circuit that the magnetron sputtering equipment of the big broad width of coating film on the flexible parent metal. The utility model provides a let gas uniform distribution's target gas circuit in big broad width scope. The utility model discloses a MFC, trachea, outlet duct, positive pole frame, its structural feature lie in MFC connecting pipe, and the trachea passes the vacuum cavity wall and links to each other with the outlet duct, and the outlet duct links to each other with the positive pole frame. 本实用新型涉及磁控溅射设备技术领域,尤其是种大宽幅在柔性基材上镀膜的磁控溅射设备的靶材气路。本实用新型提供了种在大宽幅范围上让气体均匀分布的靶材气路。本实用新型包括MFC、气管、出气管、阳极框,其结构要点在于MFC连接气管,气管穿过真空腔壁与出气管相连,出气管与阳极框相连。