Tray unit and utilize its base plate system of placing with temperature adjusting function

The utility model relates to a tray unit and utilize its base plate system of placing with temperature adjusting function. The utility model discloses a tray unit that has temperature adjusting function includes: the hypoplastron, it is formed with second heat transfer gas flow path with the mode th...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Ku Whang-Sup, Kim Hyung-Won, Kim Hyeon-Je, Jung Sang-Gon, Jung Hee-Seok
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The utility model relates to a tray unit and utilize its base plate system of placing with temperature adjusting function. The utility model discloses a tray unit that has temperature adjusting function includes: the hypoplastron, it is formed with second heat transfer gas flow path with the mode that can make gas flow along vertical direction, with second heat transfer gas flow path separately is formed with temperature regulation portion place the base plate on the second heat transfer gas flow path, the upper plate, it is in order covering the mode of hypoplastron install in on the hypoplastron, so that the plane of base plate can expose and form porosely in plasma's mode. 本实用新型涉及种具有温度调节功能的托盘单元及利用其的基板放置系统。本实用新型的具有温度调节功能的托盘单元包括:下板,其以能够使气体流动的方式沿垂直方向形成有第二热传递气体流路,与所述第二热传递气体流路分开地形成有温度调节部,在所述第二热传递气体流路上放置基板;上板,其以能够覆盖所述下板的方式安装于所述下板上,以使所述基板的平面能够暴露于等离子体的方式形成有孔。