Clean non -woven fabrics substrate for piece

The utility model discloses a clean non -woven fabrics substrate for piece (1) is formed with ridge strip (2) and groove (3) in the position of the mutual correspondence on two sides (1a, 1b) in turn to be formed with trompil (4) of lining up dual groove (3). Extend in parallel to each other ridge s...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MINORU WADA, TAEKO HAYASE, EMIKO SHIRASAKI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model discloses a clean non -woven fabrics substrate for piece (1) is formed with ridge strip (2) and groove (3) in the position of the mutual correspondence on two sides (1a, 1b) in turn to be formed with trompil (4) of lining up dual groove (3). Extend in parallel to each other ridge strip (2) and groove (3). Extend in the criss -cross direction respectively on a pair of two limits (1c, 1d) of the parallel extension with clean non -woven fabrics substrate for piece (1) ridge strip (2) and groove (3). Each groove (3) are provided with alternately: the trompil portion (3h) that has trompil (4), with adjacent this trompil (4) than in the trompil portion (3h) meet proximal end portion distance each other non - trompil portion (3n) long, that do not have trompil (4), trompil portion (3h) that adjacent groove (3) have separately and the configuration pattern of non - trompil portion (3n) difference most. Clean non -woven fabrics substrate for piece (1) includes: trompil regional (11) that form by the trompil portion (3h) of groove (3), with non - trompil regional (12) that form by non - trompil portion (3n), and trompil regional (11) and non - trompil regional (12) pattern configuration with the regulation.