Substrate of being applied to ion beam sculpture system bears device

The utility model belongs to the technical field of fine processing technology and specifically relates to substrate of being applied to ion beam sculpture system bears device, its characterized in that: the device is including rotation axis and two at least objective tables, the objective table is followed the axial interval of rotation axis sets up on the rotation axis, the objective table can wind axis of rotation, the ion beam window has been seted up on the objective table. The utility model has the advantages that: improved the substrate total quantity of ion beam sculpture system single start ability sculpture, the start -stop machine number of times of ion beam sculpture system has improved ion beam sculpture system utilization ratio when having reduced batch jobs, has reduced man -hour, satisfies sculpture work needed, while has also reduced because of the adverse effect of relapse start -stop machine to supporting vacuum system, has prolonged vacuum system's working life, has reduced manufacturing cost.