Magnetism target device
The utility model provides a magnetism target device, contains the backplate that the one was made by non -magnetic metal, reaches the sputter target that the one was made by the magnetic metal. The sputter target includes that the one sets up in the basal surface of the backplate, the one is on the...
Gespeichert in:
Hauptverfasser: | , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The utility model provides a magnetism target device, contains the backplate that the one was made by non -magnetic metal, reaches the sputter target that the one was made by the magnetic metal. The sputter target includes that the one sets up in the basal surface of the backplate, the one is on the contrary in the bombardment face of the basal surface, and at least one is gone through to the magnetic conduction passageway of the basal surface by the bombardment face, the straight -line distance of the basal surface to the bombardment face can define one target thickness, the magnetic conduction passageway includes that the one faces the first magnetic conduction section that the backplate direction is extended by the bombardment, the the first magnetic conduction section of the the first magnetic conduction duan bingyu of one intercommunication forms the second magnetic conduction section that the first contained angle of one extends, and the second magnetic conduction section of the second magnetic conduction of one intercommunication duan bingyu forms the third magnetic conduction section that one second contained angle ground extends towards the backplate, the second magnetic conduction section has the one and extends length, the ratio of the extension length and the target thickness is not less than 0.3 and just is not more than 1. |
---|