High-etching-rate no-residue acidic aluminium etching liquid production device

High-etching-rate no-residue acidic aluminium etching liquid production device

The utility model relates to a high-etching-rate no-residue acidic aluminium etching liquid production device. The high-etching-rate no-residue acidic aluminium etching liquid production device is characterized by comprising a phosphoric acid storage tank (1), an acetic acid storage tank (2), a firs...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: GE SHIYONG
Format: Patent
Sprache:eng
Schlagworte:
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The utility model relates to a high-etching-rate no-residue acidic aluminium etching liquid production device. The high-etching-rate no-residue acidic aluminium etching liquid production device is characterized by comprising a phosphoric acid storage tank (1), an acetic acid storage tank (2), a first mixing tank (3), a nitric acid storage tank (4), a second mixing tank (5), a proportioning tank (6), a deionized water storage tank (7), an anion surfactant storage tank (8), a polyoxyethylene-type nonionic surfactant storage tank (9), a third mixing tank (10), a potassium chloride storage tank (11), a potassium nitrate storage tank (12), a filter (13) and a finished product tank (14). The high-etching-rate no-residue acidic aluminium etching liquid production device is good in dispersion and mixing evenness, good in operation safety and less in impurity content of products.