Ion sputtering instrument control system

The utility model discloses an ion sputtering instrument control system which belongs to the field of semiconductor manufacturing equipment. The ion sputtering instrument control system comprises the components of: an RF power supply, a DC power supply, a PLC controller, a vacuum instrument, a sensor, a touch screen and an output executor; wherein the sensor is connected with the PLC controller. A signal which is acquired by the sensor is transmitted to the PL controller. The PLC controller is connected with the output executor. The signal which is processed by the PLC controller is transmitted to the output executor. The PLC controller is furthermore connected with the vacuum instrument, the RF power supply, the touch screen and the DC power supply respectively. The PLC controller respectively performs bidirectional signal transmission with the vacuum instrument, the RF power supply, the touch screen and the DC power supply respectively. The sensor is arranged in the station of the ion sputtering instrument. The ion sputtering instrument control system can realize one-key operation for the station and fully automatic operation process. An operator only requires sheet loading and sheet fetching. The ion sputtering instrument control system further has advantages of simple operation, high accuracy and stable product quality.